Investigation of Thin Films MgAl2O4, Deposited on the Si Substrates by Vacuum Thermal Evaporation
( Pp. 125-131)

More about authors
Stanchik Aliona V. Cand. Sci. (Phys.-Math.); senior researcher at the Laboratory of Semiconductor Physics
State Scientific and Production Association “Scientific-Practical Materials Research Centre of the National Academy of Sciences of Belarus”
Minsk, Republic of Belarus Gremenok Valery F. Dr. Sci. (Phys.-Math.); Head at the Laboratory of Semiconductor Physics
State Scientific and Production Association “Scientific-Practical Materials Research Centre of the National Academy of Sciences of Belarus”
Minsk, Republic of Belarus Trukhanova Ekaterina L. Cand. Sci. (Phys.-Math.); senior researcher at the Laboratory of Technology and Physics of Crystal Growth
State Scientific and Production Association “Scientific-Practical Materials Research Centre of the National Academy of Sciences of Belarus”
Minsk, Republic of Belarus Khoroshko Vital V. Cand. Sci. (Eng.); Head at the Department of Information and Computer Systems Design
Belarusian State University of Informatics and Radioelectronics
Minsk, Republic of Belarus Suleymanov Sultan X. Cand. Sci. (Phys.-Math.); Head at the Laboratory of High-Temperature Composite Materials and Coatings
Institute of Materials Science of the SPA “Physics-Sun” of the Academy of Sciences of the Republic of Uzbekistan
Tashkent, Uzbekistan Dyskin Valery G. Cand. Sci. (Eng.); senior research at the Laboratory of High-Temperature Composite Materials and Coatings
Institute of Materials Science of the SPA “Physics-Sun” of the Academy of Sciences of the Republic of Uzbekistan
Tashkent, Uzbekistan Djanklich Mustafa U. Cand. Sci. (Eng.); senior research at the Laboratory of High-Temperature Composite Materials and Coatings
Institute of Materials Science of the SPA “Physics-Sun” of the Academy of Sciences of the Republic of Uzbekistan
Tashkent, Uzbekistan Kulagina Natalya A. research at the Laboratory of High-Temperature Composite Materials and Coatings
Institute of Materials Science of the SPA “Physics-Sun” of the Academy of Sciences of the Republic of Uzbekistan
Tashkent, Uzbekistan Amirov Shakhboz Yo. ugli research at the Laboratory of High-Temperature Composite Materials and Coatings
Institute of Materials Science of the SPA “Physics-Sun” of the Academy of Sciences of the Republic of Uzbekistan
Tashkent, Uzbekistan
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Abstract:
The article presents data on the study of X-ray structural and microstructural characteristics of thin films of aluminum-magnesium spinel MgAl2O4 deposited on Si substrates by vacuum thermal evaporation. MgAl2O4 films have a polycrystalline rhombic structure. The values of the unit cell parameters of MgAl2O4 are calculated. Scanning electron and atomic force microscopy showed that MgAl2O4 films have a densely packed structure without cracks. Physical characteristics and good adhesion of MgAl2O4 thin films to silicon substrates indicate their possibility of using in devices of opto- and microelectronics.
How to Cite:
Stanchik A.V., Gremenok V.F., Trukhanova E.L., Khoroshko V.V., Suleymanov S.X., Dyskin V.G., Djanklich M.U., Kulagina N.A., Amirov S.Y., (2022), INVESTIGATION OF THIN FILMS MGAL2O4, DEPOSITED ON THE SI SUBSTRATES BY VACUUM THERMAL EVAPORATION. Computational Nanotechnology, 1: 125-131. DOI: 10.33693/2313-223X-2022-9-1-125-131
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Keywords:
thin films, aluminum-magnesium spinel, X-ray structural analysis, microstructure, unit cell parameters, rhombic structure.